SEPLITE® CT116W Strong Acid Macroreticular Polymeric Catalyst Resin for Esterification And Phenol Alkylation Processes
SEPLITE® CT116W is a strong acid macroreticular polymeric resin based on the matrix of styrene-DVB copolymers for heterogeneous catalysis. It performed excellent activity in polar organic systems with its special pore structure.
It i mainly used in esterification and phenol alkylation processes.
SEPLITE® CT116W Catalyst Resin for Esterification And Phenol Alkylation Processes Description Physical and Chemical Characteristics:
Ionic form | H+ |
Functional group | Sulfonic acid |
Matrix | Crosslinked polystyrene |
Physical appearance | Porous opaque beads |
Total Capacity H+ |
≥1.7 eq/L ≥4.8 mmol/g |
Water retention % | 52-58 |
Shipping weight g/ml | 0.74-0.84 |
Density g/ml | 1.15-1.25 |
Particle size mm,% | 0.4—1.25 ≥95% |
Whole beads count % | ≥95 |
Uniformity coefficient | ≤1.6 |
Nitrogen BET | |
Average pore size A | 250 |
Surface area m2/g | 30 |
Pore volume ml/g | 0.2 |
Shrinkage |
Water to phenol 32% Water to dry 52% |
Maximum Operating temperature ℃ | 130 |
Recommended storage temperature ℃ | Room temperature |
SEPLITE® CT116W Catalyst Resin for Esterification And Phenol Alkylation Processes Description Precautions:
Resins should be stored in sealed containers or bags where temperature was above 0℃ in dry conditions without exposure to direct sunlight.
Do not mix ion exchange resin with strong oxidizing agents; otherwise it will cause violent reactions.
In case of eyes contact with resins, rinse eyes immediately with plenty of water, and consult a specialist. Material and samples must be disposed according to local regulations.
Dry polymers will expand when become wet and may cause an exothermic reaction. Spilled materials may be slippery.
SEPLITE® and Monojet™ are registered trademarks of Sunresin New Materials Co. Ltd
This information is general information and may differ from that based on actual conditions. For more information about SEPLITE® resins, please contact SUNRESIN® local sales directly.